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Magnesium Nickel Cobalt Alloy
Catalog Number
ACMA00024288
Synonyms
Mg2Ni0.75Co0.25,Mg:Ni:Co(52/45/3wt%)
Molecular Weight
141.93199999999999
Molecular Formula
Mg/Ni/Co
Product Information
Description
We specialize in producing high purity Magnesium Nickel Cobalt Alloy Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in hydrogen storage, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard sputtering targets for thin film deposition are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations
InChI
InChI=1S/Co.Mg.Ni/q3*+2
InChI Key
JYCQGULUGIOTFB-UHFFFAOYSA-N
Purity
99% | 99.9% | 99.99% | 99.999%
Appearance
Metallic target
Please kindly note that our products and services are for research use only.
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